Two-photon lithography has advantages for precise additive manufacturing at the nanoscale, but its printing speed is currently too slow for large-scale practical applications. A sensitive photoresist based on zirconium oxide hybrid nanoparticles is shown to increase the linear printing speed of two-photon lithography up to the order of metres per second.
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References
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This is a summary of: Liu, T. et al. Ultrahigh-printing-speed photoresists for additive manufacturing. Nat. Nanotechnol. https://doi.org/10.1038/s41565-023-01517-w (2023).
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Sensitive photoresists for high-speed two-photon lithography. Nat. Nanotechnol. 19, 11–12 (2024). https://doi.org/10.1038/s41565-023-01518-9
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DOI: https://doi.org/10.1038/s41565-023-01518-9
