Abstract
Mobile charge carriers are essential components in high-performance, nano-engineered semiconductor devices. Employing charge carriers confined to heterointerfaces, the so-called two-dimensional electron gas, is essential for improving device performance. The real-space visualization of a two-dimensional electron gas at the nanometre scale is desirable. However, it is challenging to accomplish by means of electron microscopy due to an unavoidable strong diffraction contrast formation at the heterointerfaces. We performed direct, nanoscale electric field imaging across a GaN-based semiconductor heterointerface using differential phase contrast scanning transmission electron microscopy by suppressing diffraction contrasts. For both nearly the lattice-matched GaN/Al0.81In0.19N interface and pseudomorphic GaN/Al0.88In0.12N interface, the extracted quantitative electric field profiles show excellent agreement with profiles predicted using Poisson simulation. Furthermore, we used the electric field profiles to quantify the density and distribution of the two-dimensional electron gas across the heterointerfaces with nanometre precision. This study is expected to guide the real-space characterization of local charge carrier density and distribution in semiconductor devices.
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Data availability
The data supporting the findings of this study are available within the paper. The DPC, HAADF and EDS images are available on the GitHub repository (https://github.com/sigma-users/GaNAlInNdata).
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Acknowledgements
This work was supported by JST ERATO, grant number JPMJER2202, Japan. A part of this work was supported by JSPS KAKENHI, grant numbers JP20H05659 and JP19H05788. S. Toyama acknowledges support from a Grant-in-Aid for JSPS Research Fellow, grant number JP20J21517. T.S. acknowledges support from JST-PRESTO, grant number JPMJPR21AA; JSPS KAKENHI, grant number JP20K15014; and the Kazato Research Foundation. A part of this work was supported by the Advanced Research Infrastructure for Materials and Nanotechnology, grant number JPMXP1222UT0044, sponsored by the Ministry of Education, Culture, Sports, Science and Technology, Japan.
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S. Toyama, T.S. and N.S. designed the study and wrote the paper. S. Toyama performed the STEM experiments, simulation and image analysis. Y. Kanitani fabricated the transmission electron microscopy samples. Y. Kudo, S. Tomiya and Y.I. contributed to the discussion and comments. N.S. directed the entire study.
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Extended data
Extended Data Fig. 1 Differential phase contrast (DPC) and tilt-scan-averaged DPC (tDPC) images of the GaN/AlInN heterointerfaces.
a–d, Horizontal and vertical electric field component images, electric field vector color map, and charge density map of the GaN/Al0.81In0.19N (LM-AlInN) sample obtained via tDPC observation along the \(\left[ {{{{\mathrm{11}}}}{\bar{2}}0} \right]\) zone axis. e–h, Horizontal and vertical electric field component images, electric field vector color map, and charge density map of the GaN/ LM-AlInN sample obtained via conventional DPC observation along the \(\left[ {{{{\mathrm{11}}}}{\bar{2}}0} \right]\) zone axis (without tilt averaging). i–l, Horizontal and vertical electric field component images, electric field vector color map and charge density map obtained of the GaN/ LM-AlInN sample via DPC observation along the \(\left[ {1{\bar{1}}{{{\mathrm{00}}}}} \right]\) zone axis (without tilt averaging). m–p, Horizontal and vertical electric field component images, electric field vector color map, and charge density map obtained of the GaN/Al0.88In0.12N (PM-AlInN) sample via DPC observation along the \(\left[ {1{\bar{1}}{{{\mathrm{00}}}}} \right]\) zone axis (without tilt averaging). All scale bars correspond to 20 nm.
Extended Data Fig. 2 Differential phase contrast (DPC) and tilt-scan-averaged DPC (tDPC) profiles.
a, b, Horizontal electric field and charge density profiles of the GaN/Al0.81In0.19N (LM-AlInN) sample obtained via tDPC observation along the \(\left[ {{{{\mathrm{11}}}}{\bar{2}}0} \right]\) zone axis. c, d, Horizontal electric field and charge density profiles of the GaN/ LM-AlInN sample obtained via DPC observation along the \(\left[ {1{\bar{1}}{{{\mathrm{20}}}}} \right]\) zone axis (without tilt averaging). e, f, Horizontal electric field and charge density profiles of the GaN/LM-AlInN sample obtained via DPC observation along the \(\left[ {1{\bar{1}}{{{\mathrm{00}}}}} \right]\) zone axis (without tilt averaging). g, h, Horizontal electric field and charge density profiles of the GaN/Al0.88In0.12N (PM-AlInN) sample obtained via DPC observation along the \(\left[ {1{\bar{1}}{{{\mathrm{00}}}}} \right]\) zone axis (without tilt averaging).
Extended Data Fig. 3 Structure observation of the GaN/PM-AlInN heterostructure.
a, Atomic-resolution high-angle annular dark field STEM image of the GaN/PM-AlInN heterointerface. b, c, d, Indium, Gallium, and Aluminum energy dispersive X-ray spectroscopy elemental maps of the GaN/PM-AlInN heterointerface.
Extended Data Fig. 5 Detector and bright field (BF) disk configuration.
a, Configuration of the bright field disk (green circle) relative to the 40-segmented detector. b, 61-beam-tilt pattern acquired with the detilt coils off. In the actual experiment, these patterns converged into a single BF disk on the detector plane by the detilt coils on.
Extended Data Fig. 6 Simulated results of the tilt averaged BF disks.
a, b Simulated electron channeling patterns of [1-100] and [11–20] incident beam directions with 100 nm sample thickness. The center of the patterns corresponds to the exact zone axis. c, d, 61-beam-tilt patterns extracted from a and b under the experimental conditions of tDPC STEM. e, f, The averaged bright-field disks of the beam-tilt patterns shown in c and d, respectively. a and b, c and d, e and f are set to be the same intensity scales, respectively.
Extended Data Fig. 7 Simulated electric field profiles without high-density n-type donors in the AlInN layers.
a, Simulated electric field profile of GaN/Al0.81In0.19N (LM-AlInN) with n-type donors of 1 × 1016 e/cm−3 in the entire film. b, Simulated electric field profile of GaN/Al0.88In0.12N (PM-AlInN) with n-type donors of 1 × 1016 e/cm−3 in the entire film. c, d, Simulated charge density profiles of the GaN/ LM-AlInN and GaN/PM-AlInN heterointerfaces generated by calculating the divergence of a and b, respectively.
Extended Data Fig. 8 Fitting results of the experimental electric field profiles.
a, Electric field profile of the GaN/Al0.81In0.19N (LM-AlInN) sample along the \(\left[ {1{\bar{1}}{{{\mathrm{00}}}}} \right]\) zone axis by tDPC STEM (blue cross mark) and fitting result based on the Fang-Howard wave function using the Markov chain Monte Carlo optimization (orange line). b, Electric field profile of the GaN/Al0.88In0.12N (PM-AlInN) sample along the \(\left[ {1{\bar{1}}{{{\mathrm{00}}}}} \right]\) zone axis by tDPC STEM (blue crosses) and fitting result based on the same method (orange line).
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Toyama, S., Seki, T., Kanitani, Y. et al. Real-space observation of a two-dimensional electron gas at semiconductor heterointerfaces. Nat. Nanotechnol. 18, 521–528 (2023). https://doi.org/10.1038/s41565-023-01349-8
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DOI: https://doi.org/10.1038/s41565-023-01349-8
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