Abstract
Ion implantation has proved an elegant and successful technique, and in the manufacture of silicon devices, is now being extended both for research and practical applications in other materials, such as metals.
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References
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Dearnaley, G. Ion implantation. Nature 256, 701–705 (1975). https://doi.org/10.1038/256701a0
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DOI: https://doi.org/10.1038/256701a0
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