Lithography articles within Nature Photonics

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  • News & Views |

    A lithography-free photonic processor through dynamic control of optical gain distributions is demonstrated, allowing reconfigurable photonic neural networks and more efficient signal processing, and showing great promise in easing data traffic as well as accelerating information processing speeds.

    • Anna P. Ovvyan
    •  & Wolfram H. P. Pernice

  • Article |

    Spatial light modulator-based lithography-free programmable light transmission through optical gain medium is demonstrated for optical switching and a rudimentary photonic neural network.

    • Tianwei Wu
    • , Marco Menarini
    •  & Liang Feng

  • Article |

    High-speed, high-resolution optics-based printing typically requires femtosecond pulsed lasers. We demonstrate optical printing using indigo-blue laser diodes and a red continuous-wave laser, achieving a peak printing rate of 7 × 106 voxels s–1 at a voxel volume of 0.55 µm3.

    • Vincent Hahn
    • , Pascal Rietz
    •  & Martin Wegener

  • News & Views |

    For 20 years, nanoscale 3D printing has been based on two-photon absorption, requiring expensive pulsed lasers. Now, via a two-step absorption process, such printing has been demonstrated using a low-cost, low-power continuous-wave laser diode, showing the potential for dramatic cost reductions in 3D nanoprinting.

    • Paul V. Braun
    •  & Mark L. Brongersma

  • News & Views |

    Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10-nm light sources that could support lithography over the coming decades.

    • Greg Tallents
    • , Erik Wagenaars
    •  & Geoff Pert

  • Industry Perspective |

    Advances in nano-imprint lithography have moved the technology out of the laboratory and onto the production floor for use in a wide variety of photonic applications.

    • Gerald Kreindl
    • , Thomas Glinsner
    •  & Ron Miller

  • Industry Perspective |

    Extreme ultraviolet lithography extends photolithography to much shorter wavelengths and is a cost-effective method of producing more-advanced integrated circuits. Although some infrastructure challenges still remain, this technology is expected to begin high-volume microchip production within the next three years.

    • Christian Wagner
    •  & Noreen Harned

  • Interview |

    John Warlaumont, vice president of advanced technologies at SEMATECH, a consortium of the world's chip manufacturers, talks to Nadya Anscombe about the future of optical lithography.

    • Nadya Anscombe

  • Profile |

    Start-up company Nanoscribe has developed table-top systems that can write intricate 3D structures not possible through other lithographic technologies. Nadya Anscombe finds out how the company was founded and what its plans are for the future.

    • Nadya Anscombe

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