Imaging techniques for nanostructures
- Submission status
- Open
- Submission deadline
Nanostructures have recently widely attracted research attention due to their extraordinary physical and chemical properties which are essential in a variety of applications including energy conversion and storage, electronic and optoelectronic applications. To develop, characterise, and use such structures, it is necessary to image and probe their forms; standard optical imaging techniques are not suitable to probe such structures, due to the diffraction of light with wavelengths larger than the structures themselves. For this reason, the research community have worked in developing a range of imaging and probing techniques that allow to see far beyond the optical capabilities: scanning electron microscopy (SEM), transmission electron microscopy (TEM), etc. use electron beams to probe samples allowing the much smaller electron wavelength to define the resolution limit; whilst atomic force microscopy (AFM), scanning near-field optical microscopy (SNOM), etc. use probes dragged across the surface (like a needle on a record) to measure extremely small changes in structure.
This Collection invites submissions reporting the latest advances in imaging techniques for nanostructures and their uses in modern applications, with particular focus on physical disciplines.
Editors
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Sooyeon Hwang
Brookhaven National Laboratory, USA
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Xiu-Liang Ma
Chinese Academy of Sciences, China
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Susheng Tan
University of Pittsburgh, USA
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Hongzhou Zhang
University of Dublin, Ireland
