Abstract
A new perpendicular spin-transfer-torque magnetic-tunnel-junction (p-MTJ) spin-valve was developed to achieve a high tunneling magnetoresistance (TMR) ratio. It had a double MgO-based spin-valve structure with a top Co2Fe6B2 free layer and incorporated a single SyAF [Co(0.4 nm)/Pt(0.3 nm)]3 layer and a new buffer layer of Co(0.6)/Pt(0.3)/Co(0.4). It had a TMR ratio of 180% and anisotropy exchange field (H ex ) of 3.44 kOe after ex-situ annealing of 350 °C for 30 min under a vacuum below 10−6 torr and a perpendicular magnetic field of 3 tesla, thereby ensuring a memory margin and avoiding read disturbance failures. Its high level of performance was due to the face-center-cubic crystallinity of the MgO tunneling barrier being significantly improved by decreasing its surface roughness (i.e., peak-to-valley length of 1.4 nm).
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Introduction
Perpendicular spin-transfer-torque magnetic random access memory (p-STT MRAM) has been intensively researched because of its possible applications in various new memory devices and neuromorphic devices1,2,3,4. p-STT MRAM has many advantages over current memory devices, such as non-volatility, fast read/write speed (~10 ns), extremely low power consumption (<1 pJ/bit), high write endurance (>1012), and scalability5,6. In particular, attempts have been made to use p-STT MRAM as an embedded memory in systems-on-chip for mobile and internet-of-things applications7,8. In addition, terabit integration of p-STT MRAM cells has been investigated as a way to make a stand-alone memory device that would be a solution to the scaling limitations of dynamic random access memory below the 10-nm design rule. Furthermore, the p-STT MRAM concept has recently been expanded to include spin-neuron and synapse devices3,4. p-STT MRAM cells consist of a selective device and a perpendicular magnetic tunneling junction (p-MTJ) spin-valve9,10,11. A lot of research has gone into improving three device parameters of these spin-valves. The tunneling magnetoresistance (TMR) ratio for ensuring a memory margin should be greater than 150%. The thermal stability (Δ = K u V/k B T) necessary for a ten-year retention-time should be above 74, where K u is the magnetic anisotropy energy, V is the volume of the free layer, k B is the Boltzmann constant, and T is the temperature. The switching current density J C0 of about 1 MA/cm2 must be achieved for low power consumption. Moreover, these device parameters should be available at a back end of line (BEOL) temperature of >350 °C12,13. Note that BEOL process is the fabrication process to integrate the memory cells which include metal line interconnection, metal line isolation, passivation, and etc. The BEOL temperature (>350 °C) represents the temperature required during the BEOL process. To enhance these device parameters at the BEOL temperature, p-MTJ spin-valve structures have been developed to withstand temperatures greater than 350 °C. For example, the previous bottom CoFeB free layer has been changed to a top CoFeB free layer for increasing the TMR ratio14 and the single MgO-based p-MTJ spin-valve design has been changed to a double MgO-based p-MTJ spin-valve design for enhancing thermal stability15,16,17. In addition, it has been shown that a p-MTJ spin-valve incorporating a tungsten (W) based seed, bridging, and capping layer, instead of the tantalum (Ta) used in our previous study, enhances both the TMR ratio and thermal stability14,18,19. However, a double MgO-based p-MTJ spin-valve structure with a top CoFeB free layer remains a challenging target, because the roughness of the MgO tunneling barrier lower the TMR ratio20,21,22,23,24. Thus, in the study reported here, we designed a new double MgO-based p-MTJ spin-valve structure with a top CoFeB free layer using a single synthetic anti-ferromagnetic (SyAF) [Co/Pt]n layer instead of a double SyAF [Co/Pt]n layer that greatly reduces the roughness of the tunneling barrier, as shown in Fig. 1. First, we investigated the dependency of the TMR ratio on the body-centered-cubic (b.c.c) W bridge layer thickness for a double MgO-based p-MTJ spin-valve with a top Co2Fe6B2 free layer using a single SyAF [Co/Pt]n layer [Fig. 1(b)] and compared it with that of a double MgO-based p-MTJ spin-valve with a top Co2Fe6B2 free layer using a double SyAF [Co/Pt]n layer [i.e., the conventional SyAF [Co/Pt]n layer: Fig. 1(a)]. Second, to understand the magnetic properties that differentiate the TMR ratio, we analyzed the static spin-torque-transfer behavior of the two different p-MTJ spin-valves by using vibrating sampling magnetometer (VSM). Third, to determine the reason for the TMR ratio difference, we observed the face-centered-cubic (f.c.c) crystallinity of the MgO tunneling barrier and Co2Fe6B2 pinned layer of both spin-valves by using cross-sectional high-resolution-transmission-electron-microscopy (x-HRTEM). Finally, to investigate the dependencies of the current-vs.-voltage (I-V) curve, parallel-to-antiparallel switching voltage (V P-to-AP ), antiparallel-to-parallel switching voltage (V AP-to-P ), reading current in the low- or high-resistance state (IP or IAP), and the normalized TMR ratio-vs.-voltage curve on the structure of SyAF [Co/Pt]n layer (i.e., a single or double), we fabricated p-MTJ spin-valve cells with a 34-nm diameter bottom electrode and 60μm-diameter top-electrode (see Supplement 1).
Results
TMR ratio of p-MTJ spin-valves
The dependency of the TMR ratio on the W bridge layer thickness (t W ) was investigated as a function of the structure of SyAF [Co/Pt]n layer, as shown in Fig. 1(c). For the double MgO-based p-MTJ spin-valve with a top Co2Fe6B2 free layer using the double SyAF [Co/Pt]n layer (i.e., the conventional SyAF [Co/Pt]n layer), there was a slight increase in the TMR ratio for t W values up to around 0.3 nm, since the ferro-coupling strength slightly increased with t W . The TMR ratio abruptly decreased when t W exceeded 0.36 nm, because the ferro-coupling strength between the upper [Co/Pt]3 SyAF layer and the Co2Fe6B2 pinned layer weakened abruptly. Thus, the maximum TMR ratio was only about 156% at a t W of 0.3 nm. On the other hand, the TMR ratio of the spin-valve with a top Co2Fe6B2 free layer using a single SyAF [Co/Pt]n layer slightly increased up to a t W of 0.24 nm and then slightly decreased between t W values of 0.24 nm and 0.36 nm. The TMR ratio then rapidly decreased for t W values greater than 0.36 nm. Thus, the TMR ratio reached 180% at a t W of 0.24 nm. The dependency of the TMR ratio on t W for the p-MTJ spin-valve using the single SyAF [Co/Pt]n layer was similar to that of the spin-valve using the double SyAF [Co/Pt]n layer. However, the TMR ratio of the spin-valve using the single SyAF [Co/Pt]n layer (i.e., 180%) was much higher than that of the one using the double SyAF [Co/Pt]n layer (i.e., 156%). In particular, this means that the Co (0.6 nm)/ Pt (0.3 nm)/Co (0.4 nm) bridging buffer layer shown in Fig. 1(b) was well designed for anti-ferro-coupling the single SyAF [Co/Pt]3 layer to the Co2Fe6B2 pinned layer.
Magnetic properties of p-MTJ spin-valves
To clarify the magnetic properties of the spin-valves with the single SyAF [Co/Pt]n layers, we investigated the static magnetic momentum-vs.-applied magnetic field (M-H) loops as a function of t W , as shown in Fig. 2. The M-H loops of the spin-valves with a top Co2Fe6B2 free layer using the double SyAF [Co/Pt]n layer [Fig. 2(a–c)] were compared with those of the spin-valves with a top Co2Fe6B2 free layer using the single SyAF [Co/Pt]n layer [Fig. 2(d–f)]. In the case of the spin-valves using the double SyAF [Co/Pt]n layer, at t W of 0.16 nm, the spin-electron direction of the upper SyAF [Co/Pt]6 layer ferro-coupled with the Co2Fe6B2 pinned layer rotated from upward to downward when the external perpendicular magnetic-field (H) was scanned from +4 to +1.5 kOe, as shown in Fig. 2(a). Moreover, the spin-electron direction of the Co2Fe6B2 free layer rotated from upward to downward when H was scanned from + 0.2 to −0.2 kOe, showing that free layer had good perpendicular magnetic characteristics (i.e., the M-H loop showed good squareness) and its magnetic moment was ~0.2 memu, as shown in the inset of Fig. 2(a). The spin-electron direction of the lower SyAF [Co/Pt]3 layer then rotated from upward to downward and the magnetic moment of the spin-valve saturated at 0.91 memu when H was scanned from −1.5 to −4 kOe. As a result, at a t W of 0.16 nm, the spin-valve had an anisotropy exchange field (H ex ) of 2.36 kOe (Fig. 2(a)). Next, when t W was changed from 0.16 to 0.30 nm, the squareness of the M-H loops of both the upper SyAF [Co/Pt]3 layer ferro-coupled with the Co2Fe6B2 pinned layer and the lower SyAF [Co/Pt]6 layer considerably improved (compare the red boxes in Fig. 2(a) and (b)). In addition, the squareness of the M-H loop of the Co2Fe6B2 free layer slightly improved, resulting in an increase of the TMR ratio from 143 to 156%, (see the insets of Fig. 2(a), Fig. 2(b), and Fig. 1(c)). Recall that the ferro-coupling strength between the upper SyAF [Co/Pt]3 layer and the Co2Fe6B2 pinned layer directly affect the TMR ratio; i.e., a higher ferro-coupling strength leads to a higher TMR ratio25. Furthermore, H ex of the spin-valve increased slightly from 2.36 to 2.64 kOe, which would make the spin-valve more susceptible to read disturbance. Otherwise, when t W was increased from 0.30 to 0.48 nm, the M-H loop of the spin-valve changed abnormally because the thicker t W could not perfectly ferro-couple the upper SyAF [Co/Pt]3 layer with the Co2Fe6B2 pinned layer (see the red box in Fig. 2(c)). In particular, the squareness of the M-H loop of the Co2Fe6B2 free layer drastically deteriorated, resulting in the TMR ratio falling from 156 to 0% (the insets of Fig. 2(b) and (c)). Note that the magnetic moment increased from 190 to 271 μemu, indicating that the upper SyAF [Co/Pt]3 layer did not completely ferro-couple with the Co2Fe6B2 pinned layer since the magnetic moment of the Co2Fe6B2 free layer was only 190 μemu. In addition, H ex of the spin-valve greatly decreased from 2.64 to 1.16 kOe, which would cause a read failure.
In contrast, for the p-MTJ spin-valve using the single SyAF [Co/Pt]n layer, at a t W of 0.16 nm, its M-H loop was completely different from that of the spin-valve using the double SyAF [Co/Pt]n layer; i.e., there was no the squareness in the M-H loop for the single SyAF layer (see the red boxes in Fig. 2(a) and (d)). The spin-electron direction of the Co2Fe6B2 pinned layer gradually rotated from upward to downward and saturated as the external perpendicular magnetic-field (H) was scanned from +6.5 to +1.5 kOe, (Fig. 2(d)). Then, the spin-electron direction of the Co2Fe6B2 free layer rotated from upward to downward when H was scanned from + 0.2 to −0.2 kOe, meaning that the free layer showed good perpendicular magnetic characteristics and the TMR ratio was 173%. Finally, the spin-electron direction of the single SyAF [Co/Pt]3 layer rotated from upward to downward when H was scanned from −0.2 to −6.5 kOe, resulting in an H ex of 2.52 kOe, which would be sufficient to avoid a read disturbance failure (Fig. 2(d)). In addition, when t W was changed from 0.16 to 0.30 nm, the squareness of the M-H loop of the Co2Fe6B2 free layer slightly improved, resulting in an increase in the TMR ratio from 173 to 180% (compare the insets of Fig. 2(d), Fig. 2(e), and Fig. 1(c)). H ex of the p-MTJ spin-valve considerably increased from 2.52 to 3.44 kOe, probably improving the read disturbance of p-MTJ spin-valves. Furthermore, when t W changed from 0.30 to 0.48 nm, the M-H loop abnormally deteriorated because the thicker t W could not perfectly anti-ferro-couple the single SyAF [Co/Pt]3 layer with the Co2Fe6B2 pinned layer (Fig. 2(f)). In particular, the squareness of the M-H loop of the Co2Fe6B2 free layer greatly deteriorated, resulting the TMR ratio falling from 180 to ~0% (see the insets of Fig. 2(e) and (f)). In addition, H ex abruptly dropped from 2.64 to 1.16 kOe, which would probably cause a read disturbance failure. In summary, the M-H loop of the p-MTJ spin-valves using a single SyAF [Co/Pt]n layer had an H ex that was little higher than that of those using a double SyAF [Co/Pt]n layer, although the total thickness of the SyAF [Co/Pt]n layer was reduced considerably from 8.65 to 3.55 nm, which would not cause a read disturbance failure. However, the comparison of the M-H loops did not explain why the spin-valve using a single SyAF [Co/Pt]n layer had a higher TMR ratio than those using the double SyAF [Co/Pt]n layer. Thus, we investigated the face-centered-cubic (f.c.c) crystallinity of the p-MTJ spin-valves by using x-HRTEM. Here we should recall that the f.c.c crystallinity of the MgO tunneling barrier directly affects the probability of coherent tunneling of the spin electrons, determining dominantly the TMR ratio of a p-MTJ spin-valve14,17,18,19,20,21,22,23,24,25,26,27,28,29,30.
Crystallinity of the MgO tunneling barrier
The f.c.c crystallinity of the MgO tunneling barrier was examined in the spin valves with the double SyAF [Co/Pt]n layer at t W = 0.30 nm (i.e., Fig. 2(b)) and a single SyAF [Co/Pt]n layer at t W = 0.24 nm (i.e., Fig. 2(e)), as shown in the x-HRTEM images of Fig. 3. The MgO tunneling barrier and capping layer of the spin-valve using the double SyAF [Co/Pt]n layer had a fluctuating surface like a sinusoidal wave (Fig. 3(a) and (c)). On the other hand, the MgO tunneling barrier and capping layer of the spin-valve using the single SyAF [Co/Pt]n layer had a flat surface (Fig. 3(b) and (d)). The surface roughness of the tunneling barrier and capping layer became smoother as the SyAF [Co/Pt]n layer thickness was decreased from 8.65 nm (i.e., a double SyAF [Co/Pt]n layer) to 3.55 nm (i.e., a single SyAF [Co/Pt]n layer). In particular, the peak-to-valley of the MgO tunneling barrier (ΔP-V) for the single SyAF [Co/Pt]n layer (i.e., 1.4 nm for tSyAF = 3.55 nm) was much less than that for the double SyAF [Co/Pt]n layer (i.e., 2.6 nm for tSyAF = 8.65 nm), as shown in Fig. 3(a) and (b).
Since the f.c.c crystallinity of the MgO tunneling barrier directly influences the coherent tunneling of spin-electrons in the spin-valves, x-HRTEM images of regions i and ii in Fig. 3(a) and (b) were taken (Fig. 3(c) and (d)). For the spin-valve with a double SyAF [Co/Pt]n layer, the fluctuating surface of the MgO tunneling barrier and capping layer (Fig. 3(c)) originated from the thicker SyAF [Co/Pt]n layer (tSyAF = 8.65 nm). In particular, the MgO capping layer showed almost amorphous regions (a and b in Fig. 3(c)) together with a region of locally f.c.c textured crystallinity (c in Fig. 3(c)) and it had a large thickness variation (i.e., ~0.64 nm at i and ~0.80 nm at ii in Fig. 3(c)). In contrast, the tunneling barrier looked almost completely f.c.c textured (d and e in Fig. 3(c)) and its thickness was ~0.96 nm at iii and 0.86 nm at iv in Fig. 3(c). Otherwise, the spin-valve with the single SyAF [Co/Pt]n layer had a much smoother MgO capping layer than that using the double SyAF [Co/Pt]n layer, (Fig. 3(c) and (d)) resulting in an uniform capping layer thickness (i.e., ~0.91 nm at i and ~0.85 nm at ii in Fig. 3(d)). In particular, except at the grain boundaries, the MgO capping layer was almost completely f.c.c, as shown in a and b in Fig. 3(d). Furthermore, the spin-valve with the single SyAF [Co/Pt]n layer had a tunneling layer with a flatter surface than that of the one with the double SyAF [Co/Pt]n layer (Fig. 3(c) and (d)). It had a uniform MgO tunneling barrier layer thickness (i.e., ~1.10 nm at iii and ~1.14 nm at iv in Fig. 3(d)). This result originated from the thickness difference between the single (tSyAF = 1.40 nm) and double SyAF [Co/Pt]n layer (tSyAF = 8.65 nm). The MgO tunneling barrier was f.c.c. except at the grain boundaries, as shown in c and d in Fig. 3(d). In particular, the tunneling barrier (i.e., 1.10~1.14 nm) for the spin-valve using the single SyAF [Co/Pt]n layer was quite thicker than that of the spin-valve with the double SyAF layer (i.e., 0.86~0.96 nm). These results indicate that the f.c.c. crystallinity of the MgO tunneling-barrier layer for the spin-valve using single SyAF [Co/Pt]n layer was much superior to that of the spin-valve using the double SyAF [Co/Pt]n layer. Here, we should recall that larger surface roughness in the MgO tunneling barrier reduces the hybridization of the Co-O and Fe-O atoms at the interface between the Co2Fe6B2 free layer and tunneling barrier which degrades the i-PMA characteristics of the p-MTJ20,31,32. In addition, better f.c.c crystallinity of the MgO tunneling barrier leads to a higher coherent tunneling ability of spin-electrons. Thus, both surface roughness and f.c.c crystallinity directly and dominantly affect the TMR ratio of the p-MTJ spin-valves; i.e., smaller surface roughness and better f.c.c crystallinity of the MgO tunneling barrier leads to a higher TMR ratio14,17,18,19,20,21,22,23,24,25,26,27,28,29,30. Thus, as revealed in the x-HRTEM image, the MgO tunneling barrier of the spin-valve using the single SyAF [Co/Pt]n layer obviously showed a smaller surface roughness and better f.c.c crystallinity compared with the barrier of the spin-valve with the double SyAF [Co/Pt]n layer. As a result, the p-MTJ spin-valve using the single SyAF [Co/Pt]n layer (~180%) achieved a higher TMR ratio than that of the one using the double SyAF [Co/Pt]n layer (~156%).
Discussion
Double MgO-based p-MTJ spin-valve with a top Co2Fe6B2 free layer using a double SyAF [Co/Pt]n layer (Fig. 1(a)) have been intensively studied in order to achieve TMR ratios higher than 150% in order to ensure a memory margin and enough thermal stability (Δ) for a ten-year retention-time at BEOL temperatures higher than 350 °C. However, the high surface roughness of the MgO tunneling barrier that originates from the thick double SyAF [Co/Pt]n layer (i.e., 8.65 nm) potentially limits further enhancement of the TMR ratio. As a solution, a double MgO-based p-MTJ spin-valve structure with a top Co2Fe6B2 free layer using a single SyAF [Co/Pt]n layer (Fig. 1(b)) was developed that has a thinner single SyAF [Co/Pt]n layer (i.e., 3.55 nm) and a buffer layer bridging the single SyAF [Co/Pt]n layer and the Co2Fe6B2 pinned layer (i.e., Co/Pt/Co layer). This device structure demonstrated a sufficient anisotropy exchange field (i.e. 3.44 kOe) for avoiding read disturbance failures and a TMR ratio about 25% higher than that of a p-MTJ spin-valve using double SyAF [Co/Pt]n layer. In particular, the f.c.c crystallinity of the MgO tunneling barrier was improved by the greatly reduced surface roughness of the MgO tunneling barrier (i.e., 1.4 nm). Therefore, the double MgO-based p-MTJ spin-valve with a top Co2Fe6B2 free layer using a single SyAF layer would be a promising spin-valve structure for future device application such as a terra-bit integration stand-alone memory, an embedded memory, a storage class memory, etc.
Methods
All double MgO-based p-MTJ spin-valves were fabricated using a 12-inch-wafer multi-chamber cluster-magnetron sputtering-system under a high vacuum of less than 1 × 10−8 torr. In particularly, the double MgO-based p-MTJ spin-valve structure with a top Co2Fe6B2 free layer using a double SyAF [Co/Pt]n layer were fabricated as a vertical stack containing a 12-inch SiO2 wafer, W/TiN bottom electrode, Ta buffer layer, Pt seed layer, [Co(0.4 nm)/Pt(0.3 nm)]6/Co(0.6 nm) lower SyAF layer, Ru spacer layer (0.85 nm), Co(0.6 nm)/Pt(0.3 nm)/[Co(0.4 nm)/Pt(0.3 nm)]3 upper SyAF layers, and a Co buffer layer (0.4 nm), as shown in Fig. 1(a). The thickness of the tungsten (W) bridge layer was varied from 0.18 nm to 0.48 nm, and the p-MTJ consisted of a Co2Fe6B2 pinned layer (1.05 nm), MgO tunneling barrier (1.2 nm), Fe insertion layer (0.44 nm), Co2Fe6B2 free layer (1.0 nm), W spacer layer (0.4 nm), Co2Fe6B2 (1.0 nm), and MgO (1.0 nm)/W capping layer. The double MgO-based p-MTJ spin-valve with a top Co2Fe6B2 free layer using a single SyAF [Co/Pt]n layer were fabricated wherein the ratio of the number of [Co/Pt] multi-layers between the upper and lower SyAF [Co/Pt]n layer was varied from 3:6 (i.e., a double SyAF [Co/Pt]n layer) to 0:3, as shown in Fig. 2 (b). In addition, the bridging buffer layer was a Co/Pt/Co layer instead of the single Co layer (compare Fig. 1(a) and (b)). Note that the bridging buffer layer is necessary to ferro-couple the Co2Fe6B2 free layer with the SyAF [Co/Pt]n layer. The spin-valves were ex-situ annealed at 350 °C for 30 min under a vacuum below 10−6 torr and a perpendicular magnetic field of 3 tesla. The TMR ratios of the 12-inch wafer p-MTJ spin-valves were estimated by using current in-plane tunneling (CIPT) at room temperature. Afterward, the wafers were cut into 1 × 1 cm2 pieces. The magnetic properties (out-of-plane and in-plane) for the two different spin-valves were characterized by using vibrating sampling magnetometer (VSM) at room temperature. The crystallinity was estimated by using x-HRTEM at an acceleration voltage of 200 keV.
Change history
27 April 2018
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Acknowledgements
This work was supported by Basic Science Research Program through the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIP) (No. 2017R1A2A1A05001285) and Brain Korea 21 PLUS Program in 2014.
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J.Y. Choi and J.G. Park conceived and designed the study. J.Y. Choi and J.U. Baek fabricated all patterns and carried out experiments, with the help of J.G. Park. Contributions to the measurements were made by J.Y. Choi, D.G. Lee and J.U. Baek. All authors contributed to discussions regarding the research. J.Y. Choi and J.G. Park wrote the manuscript.
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Choi, JY., Lee, Dg., Baek, JU. et al. Double MgO-based Perpendicular Magnetic-Tunnel-Junction Spin-valve Structure with a Top Co2Fe6B2 Free Layer using a Single SyAF [Co/Pt]n Layer. Sci Rep 8, 2139 (2018). https://doi.org/10.1038/s41598-018-20626-4
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DOI: https://doi.org/10.1038/s41598-018-20626-4
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