Abstract
THE temperature Ts at which the substrate is maintained during deposition is perhaps the most critical parameter determining the structure and properties of thin solid films produced by the very important techniques of vacuum evaporation and sputtering1. Apart from situations when Ts becomes so great as to approach the melting point of the film2 or to cause complete re-evaporation, the reported variation in properties as a function of Ts is almost always monotonic. Some properties of a few substances have been shown to be optimal at specified Ts and the smoothness of some epitaxial films have been observed to go through a maximum, but only in the case of poly-crystalline metals does there seem to have been any attempt to systematise these observations.
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VINCETT, P., BARLOW, W. & ROBERTS, G. Quality of vacuum-deposited films. Nature 255, 542–544 (1975). https://doi.org/10.1038/255542a0
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DOI: https://doi.org/10.1038/255542a0
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