Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10-nm light sources that could support lithography over the coming decades.
This is a preview of subscription content, access via your institution
Relevant articles
Open Access articles citing this article.
-
Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation
Microsystems & Nanoengineering Open Access 30 March 2023
-
The challenges of modern computing and new opportunities for optics
PhotoniX Open Access 09 September 2021
-
Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
Nature Communications Open Access 11 May 2020
Access options
Subscribe to this journal
Receive 12 print issues and online access
$209.00 per year
only $17.42 per issue
Buy this article
- Purchase on Springer Link
- Instant access to full article PDF
Prices may be subject to local taxes which are calculated during checkout
References
Moore, G. Electronics 38, 114–117 (1965).
Wagner, C. & Harned, N. Nature Photon. 4, 24–26 (2010).
Otsuka, T. et al. Appl. Phys. Lett. 97, 111503 (2010).
Bertilson, M., von Hofsten, O., Vogt, U., Holmberg, A. & Hertz, H.M. Opt. Express 17, 11057–11065 (2009).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Tallents, G., Wagenaars, E. & Pert, G. Lithography at EUV wavelengths. Nature Photon 4, 809–811 (2010). https://doi.org/10.1038/nphoton.2010.277
Issue Date:
DOI: https://doi.org/10.1038/nphoton.2010.277
This article is cited by
-
Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation
Microsystems & Nanoengineering (2023)
-
Helical displacement Talbot lithography for duty cycles of periodic patterning
Journal of Optics (2022)
-
The challenges of modern computing and new opportunities for optics
PhotoniX (2021)
-
Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
Nature Communications (2020)
-
Two-photon lithography for 3D magnetic nanostructure fabrication
Nano Research (2018)