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Letters to Nature
Nature 414, 625-627 (6 December 2001) | doi:10.1038/414625a; Received 5 July 2001; Accepted 1 October 2001
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Direct splitting of water under visible light irradiation with an oxide semiconductor photocatalyst
Zhigang Zou1, Jinhua Ye2, Kazuhiro Sayama1 & Hironori Arakawa1
- Photoreaction Control Research Center (PCRC), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
- Materials Engineering Laboratory (MEL), National Institute for Materials Science (NIMS), 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
Correspondence to: Zhigang Zou1 Correspondence and requests for materials should be addressed to Z.Z. (e-mail: Email: z.zou@aist.go.jp) or H.A. (e-mail: Email: h.arakawa@aist.go.jp).
Abstract
The photocatalytic splitting of water into hydrogen and oxygen using solar energy is a potentially clean and renewable source for hydrogen fuel. The first photocatalysts suitable for water splitting1, or for activating hydrogen production from carbohydrate compounds made by plants from water and carbon dioxide2, were developed several decades ago. But these catalysts operate with ultraviolet light, which accounts for only 4% of the incoming solar energy and thus renders the overall process impractical. For this reason, considerable efforts have been invested in developing photocatalysts capable of using the less energetic but more abundant visible light3, 4, 5, 6, 7, which accounts for about 43% of the incoming solar energy. However, systems that are sufficiently stable and efficient for practical use have not yet been realized. Here we show that doping of indium-tantalum-oxide with nickel yields a series of photocatalysts, In1-xNixTaO4 (x = 0–0.2), which induces direct splitting of water into stoichiometric amounts of oxygen and hydrogen under visible light irradiation with a quantum yield of about 0.66%. Our findings suggest that the use of solar energy for photocatalytic water splitting might provide a viable source for 'clean' hydrogen fuel, once the catalytic efficiency of the semiconductor system has been improved by increasing its surface area and suitable modifications of the surface sites.
- Photoreaction Control Research Center (PCRC), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
- Materials Engineering Laboratory (MEL), National Institute for Materials Science (NIMS), 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
Correspondence to: Zhigang Zou1 Correspondence and requests for materials should be addressed to Z.Z. (e-mail: Email: z.zou@aist.go.jp) or H.A. (e-mail: Email: h.arakawa@aist.go.jp).
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