Correction to: Scientific Reports https://doi.org/10.1038/s41598-017-01502-z, published online 03 May 2017
This Article contains errors in Figure 4b. The colours of the curves in the left panel were inadvertently switched. The correct Figure 4b appears below as Figure 1.
Author information
Authors and Affiliations
Corresponding author
Additional information
The original article can be found online at https://doi.org/10.1038/s41598-017-01502-z.
Rights and permissions
Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
About this article
Cite this article
Zallo, E., Cecchi, S., Boschker, J.E. et al. Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys. Sci Rep 8, 5015 (2018). https://doi.org/10.1038/s41598-018-23156-1
Published:
DOI: https://doi.org/10.1038/s41598-018-23156-1
Comments
By submitting a comment you agree to abide by our Terms and Community Guidelines. If you find something abusive or that does not comply with our terms or guidelines please flag it as inappropriate.