Abstract
A novel negative-working thermally stable photosensitive polymer based on poly(naphthylene ether), a cross-linker hexa(methoxymethyl)melamine, and a photoacid generator (5-propylsulfonyl-oxyimino-5H-thiophen-2-ylidene)-(2-methylphenyl)acetonitrile. Poly(naphthylene ether) was prepared via the oxidative coupling polymerization of 4,4′-bis(1-naphthyloxy)-2,2′-dimethylbiphenyl. This photosensitive polymer showed a high sensitivity (D0.5) of 6.0 mJ cm−2 and a high contrast (γ0.5) of 5.2, when it was exposed to a 436 nm light, post-exposure baked at 140 °C for 5 min, and developed with toluene. A negative image featuring 20 μm line and space patterns was obtained on a film exposed to 20 mJ cm−2 of visible light at 436 nm by the contact-printed mode. The resulting polymer film had the low dielectric constant of 2.8 and high thermal stability.
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“Polyimide,” M. K. Ghosh and K. L. Mittal, Ed., M. Dekker, New York, 1996, p121.
“Photosensitive Polyimide: Fundamental and Applications,” K. Horie and T. Yamashita, Ed., Technomic, Lancasteer, 1995.
N. Yoda, Polym. Adv. Technol., 8, 215 (1997).
H. Seino, A. Mochizuki, O. Haba, and M. Ueda, J. Polym. Sci., Part A: Polym. Chem., 36, 2261 (1998).
Y. Watanabe, Y. Shibasaki, S. Ando, and M. Ueda, Polym. J., 37, 270 (2005).
K. Sakayori, Y. Shibasaki, and M. Ueda, Polym. J., 38, 1189 (2006).
G. Maier, Prog. Polym. Sci., 26, 3 (2001).
K. Fukukawa, Y. Shibasaki, and M. Ueda, Polym. J., 37, 74 (2005).
K. Fukukawa and M. Ueda, Polym. J., 38, 405 (2006).
F. Toyokawa, Y. Shibasaki, and M. Ueda, Polym. J., 37, 517 (2005).
K. Takeshi, K. Okuyama, Y. Ohba, and M. Ueda, J. Photopolym. Sci. Technol., 13, 345 (2000).
K. Tsuchiya, Y. Shibasaki, M. Suzuki, and M. Ueda, J. Polym. Sci., Part A: Polym. Chem., 42, 2235 (2004).
K. Tsuchiya, Y. Shibasaki, and M. Ueda, Polymer, 45, 6873 (2004).
T. M. Long and T. M. Swager, J. Am. Chem. Soc., 125, 14113 (2003).
K. Tsuchiya, Y. Shibasaki, S. Ando, and M. Ueda, Macromolecules, 37, 4794 (2004).
K. Tsuchiya, Y. Shibasaki, M. Aoyagi, and M. Ueda, Macromolecules, 39, 3964 (2006).
K. Tsuchiya and M. Ueda, Polym. J., 38, 956 (2006).
M. M. O’Toole, M. P. de Grandpre, and W. E. Feely, J. Electrochem. Soc., 135, 1026 (1988).
T. Asakura, H. Yamato, and M. Ohwa, J. Photopolym. Sci. Technol., 13, 223 (2001).
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Tsuchiya, K., Shibasaki, Y. & Ueda, M. A Negative Type Photosensitive Polymer Based on Poly(naphthylene ether), a Cross-Linker, and a Photoacid Generator with Low Dielectric Constant. Polym J 39, 442–447 (2007). https://doi.org/10.1295/polymj.PJ2006213
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DOI: https://doi.org/10.1295/polymj.PJ2006213
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