Abstract
A positive-type photosensitive polybenzoxazole (PSPBO) based on a poly(o-hydroxy amide) (PHA), a dissolution inhibitor (DI) 9,9-bis(4-tert-butoxycarbonyloxyphenyl)fluorene (t-BocBHF), a thermoacid generator (TAG) isopropyl p-toluenesufonate (ITS), and a photoacid generator (PAG) (5-propylsulfonyloxyimino-5H-thiophene-2-ylidene)-(2-methylphenyl)acetonitrile (PTMA) has been developed. ITS was easily prepared by reaction of p-toluenesulfonyl chloride with isopropyl alcohol. The dissolution behavior of the PSPBO system was studied in relation to PTMA loadings, and post exposure baking (PEB) temperature and time. The PSPBO consisting of PHA (73 wt %), t-BocBHF (18 wt %), ITS (7.5 wt %), and PTMA (1.5 wt %) exhibited a sensitivity of 33 mJ/cm2 and a contrast of 5.1 when exposed to 365 nm light (i-line) and developed with an aqueous alkaline developer, 2.38 wt % tetramethylammonium hydroxide solution (TMAHaq)/2.5 wt % iso-propanol (i-PrOH). A clear positive image with 3 μm features was produced by contact-printing and converted into a poly(benzoxazole) (PBO) pattern upon heating at 250 °C for 20 min. Thus, the ITS is effective as a TAG for improving the sensitivity and low temperature cyclization of PHA into the PBO as well to meet practical requirement in the industry.
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Ogura, T., Yamaguchi, Kt., Shibasaki, Y. et al. Photosensitive Poly(benzoxazole) Based on Poly(o-hydroxy amide), Dissolution Inhibitor, Thermoacid Generator, and Photoacid Generator. Polym J 39, 245–251 (2007). https://doi.org/10.1295/polymj.PJ2006174
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DOI: https://doi.org/10.1295/polymj.PJ2006174
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