Abstract
Polyamides containing thymine photodimer units in the main chain were found to be applicable to a positive-chain scission type photoresist upon deep-UV exposure. Photo-dissociations of cyclobutane-type photodimers of thymine units caused the scission of the polymer chains, leading to decrease in molecular weight of the polymers. Photolithographic sensitivity and resolution test for these polymers indicated good sensitivity values with novel resolution of even 0.3 μm.
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Moghaddam, M., Inaki, Y. & Takemoto, K. Photolysis of Polyamides Containing Thymine Photodimer Units in the Main Chain and Application to Deep-UV Positive Type Photoresists. Polym J 22, 468–476 (1990). https://doi.org/10.1295/polymj.22.468
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DOI: https://doi.org/10.1295/polymj.22.468