Industry Perspective | Published:

Next-generation lithography

Making a good impression

Nature Photonics volume 4, pages 2728 (2010) | Download Citation

Advances in nano-imprint lithography have moved the technology out of the laboratory and onto the production floor for use in a wide variety of photonic applications.

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Author information

Affiliations

  1. Gerald Kreindl is Product Manager at EV Group, Erich Thallner Strasse 1, A-4782 St. Florian am Inn, Schärding, Austria.  g.kreindl@evgroup.com

    • Gerald Kreindl
  2. Thomas Glinsner is Head of Product Management at EV Group, Erich Thallner Strasse 1, A-4782 St. Florian am Inn, Schärding, Austria.  t.glinsner@evgroup.com

    • Thomas Glinsner
  3. Ron Miller is NIL Business Development and External R&D Program Manager at EV Group, Erich Thallner Strasse 1, A-4782 St. Florian am Inn, Schärding, Austria.  r.miller@evgroup.com

    • Ron Miller

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About this article

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DOI

https://doi.org/10.1038/nphoton.2009.252

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