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EUV lithography

Lithography gets extreme

Nature Photonics volume 4, pages 24–26 (2010)Cite this article

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Extreme ultraviolet lithography extends photolithography to much shorter wavelengths and is a cost-effective method of producing more-advanced integrated circuits. Although some infrastructure challenges still remain, this technology is expected to begin high-volume microchip production within the next three years.

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Figure 1: Since the mid-1980s, the wavelength of light used in lithography systems has reduced by almost half from 365 nm to 193 nm.

ASML

Figure 2
Figure 3: EUV sources for lithography applications based on laser- (left) or discharge-produced (right) plasmas of tin.

ASML

Acknowledgements

The authors would like to thank David Brandt of Cymer and Hans Meiling of ASML for their help in creating this article.

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Authors and Affiliations

  1. Christian Wagner is Senior Product Manager of EUV at ASML, PO Box 324, 5500 AH Veldhoven, The Netherlands.,

    Christian Wagner

  2. Noreen Harned is Vice President of Marketing EUV at ASML, PO Box 324, 5500 AH Veldhoven, The Netherlands.,

    Noreen Harned

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  1. Christian Wagner
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Correspondence to Christian Wagner.

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Wagner, C., Harned, N. Lithography gets extreme. Nature Photon 4, 24–26 (2010). https://doi.org/10.1038/nphoton.2009.251

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