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An important step towards scaling up lithographic nanofabrication is the development of resists that can be processed with innocuous chemicals, such as water. Fiorenzo Omenetto and co-workers report on the use of silk fibroin as a natural resist for electron-beam lithography and the development of a fabrication protocol that is all-water-based. Silk can be used either as a positive or negative resist and can also be functionalized with specific enzymes that retain their activity even after electron-beam exposure. The cover shows silk fibres and water droplets.
Reflecting on a provocative report from 2002 on the benefits of fusing different technologies, Chris Toumey considers the importance of being realistic about the potential of nanotechnology.
Controlled optical manipulation of a single dielectric nanoparticle is achieved with a bowtie nanoantenna placed at the end of the probe of a near-field scanning microscope.
The third-harmonic-generation efficiency of an individual indium tin oxide nanoparticle is enhanced by more than 106 fold by placing it within the gap of a plasmonic gold dimer nanoantenna.
Gas vesicles, a class of protein nanostructure found naturally in microorganisms, are employed as ultrasound contrast agents for molecular imaging on the nanoscale.