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Volume 9 Issue 4, April 2014

An important step towards scaling up lithographic nanofabrication is the development of resists that can be processed with innocuous chemicals, such as water. Fiorenzo Omenetto and co-workers report on the use of silk fibroin as a natural resist for electron-beam lithography and the development of a fabrication protocol that is all-water-based. Silk can be used either as a positive or negative resist and can also be functionalized with specific enzymes that retain their activity even after electron-beam exposure. The cover shows silk fibres and water droplets.

Letter p306; News & Views p251

BACKGROUND IMAGE: FIORENZO OMENETTO; WATER DROPLETS © MURRAY CLARKE/ALAMY

COVER DESIGN: ALEX WING

Editorial

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Thesis

  • Reflecting on a provocative report from 2002 on the benefits of fusing different technologies, Chris Toumey considers the importance of being realistic about the potential of nanotechnology.

    • Chris Toumey
    Thesis
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Research Highlights

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News & Views

  • p–n diodes can be fabricated from a single layer of WSe2 crystal.

    • Rudolf Bratschitsch
    News & Views
  • Biologically derived, nanoscale gas vesicles can be used as ultrasound contrast agents.

    • Mark Borden
    • Shashank Sirsi
    News & Views
  • Nanoscale gas bubbles can act as selective membranes and be used to estimate the condensation coefficient of water.

    • Lydéric Bocquet
    News & Views
  • Silk fibroin can be used as a photoresist in water-based electron-beam lithographic processing.

    • Alex Robinson
    News & Views
  • Controlled optical manipulation of a single dielectric nanoparticle is achieved with a bowtie nanoantenna placed at the end of the probe of a near-field scanning microscope.

    • Patrick C. Chaumet
    • Adel Rahmani
    News & Views
  • A single nitrogen–vacancy centre can be used to probe the location of electron spins with subnanometre precision.

    • Lloyd Hollenberg
    News & Views
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Letter

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Article

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