Abstract
A NUMBER of methods are available for the preparation of trichlorosilane (SiHCl3), in the laboratory, for example, by the action of dry hydrochloric acid gas on silicon1,2 and by the reaction of hydrochloric acid gas and metallic silicides3–7, such as magnesium silicide, iron silicide, or 25 per cent copper silicide. Trichlorosilane has also been prepared by passing a mixture of halosilanes and excess of hydrogen or hydrogen-halide over aluminium, zinc, or magnesium8, or by halogenation of monosilane (SiH4), with hydrochloric acid gas in presence of aluminium chloride as a catalyst9.
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DUDANI, P., PLUST, H. A Simplified Method for Preparation of Very Pure Silicochloroform. Nature 194, 85–86 (1962). https://doi.org/10.1038/194085a0
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DOI: https://doi.org/10.1038/194085a0
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