Postdoctoral Scientist Atomic Layer Deposition of functional oxides (f/m/d)

Helmholtz-Zentrum Berlin for Materials and Energy (HZB)

Berlin, Germany

Work group:

Functional Oxides for Energy-Efficient Information Technology



Area of research:

Scientific / postdoctoral posts



Job description:


Reference No. EM 2019/26


The Institute Functional Oxides for Energy-Efficient Information Technology is looking for


Postdoctoral Scientist Atomic Layer Deposition of functional oxides (f/m/d)


Tasks



  • Atomic Layer Deposition of Ga2O3-based materials with in situ ellipsometry characterization

  • Develop routes to the epitaxial growth of oxides by ALD

  • Structural, microstructural and chemical characterization of the films by various methods

  • Device fabrication and electrical characterization

  • Supervise Master and/or PhD students

  • Presentation at international conferences and scientific publications of experimental results

Requirements

  • Completed PhD in Physics, Chemistry or Materials Science
  • Mandatory experience (minimum 2 years) in Atomic Layer Deposition
  • Extended experience in thin film characterization (XRD, AFM, XPS…)
  • Experience in the field of oxide materials
  • Excellent written and spoken skills in English

Further Information

Prof. Dr. Catherine Dubourdieu

catherine.dubourdieu@helmholtz-berlin.de

Closing Date: 15.11.2019


Please apply via recruiter’s website.

Quote Reference: EM 2019/26

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