Scanning probe techniques such as atomic force microscopy can be readily harnessed to prepare nanoscale structures with exquisite resolution, but are not in general suited for high-throughput patterning. Techniques based on contact printing, on the other hand, offer high throughput over large areas, but can't compete on resolution. Now, an approach is described that offers the best of both worlds: by attaching an array of hard, scanning-probe-like silicon tips to a flexible elastomeric substrate (similar to those used in contact printing), it is possible to rapidly create arbitrary patterns with sub-50-nm resolution over centimetre-scale areas.
- Wooyoung Shim
- Adam B. Braunschweig
- Chad A. Mirkin