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Quantum dot patterning by direct photolithography

A ‘dual-ligand passivation system’ is designed and synthesized to functionalize colloidal quantum dots to realize ultra-high resolution patterns by direct photolithography.

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Fig. 1: Schematic illustration of QD patterning process.


  1. Murray, C. B., Norris, D. J. & Bawendi, M. G. J. Am. Chem. Soc. 115, 8706–8715 (1993).

    CAS  Article  Google Scholar 

  2. Hahm, D. et al. Nat. Nanotechnol. (2022).

    Article  Google Scholar 

  3. Xiang, C. et al. Nat. Commun. 11, 1646 (2020).

    Article  Google Scholar 

  4. Meng, T. et al. Nat. Photonics 16, 297–303 (2022).

    CAS  Article  Google Scholar 

  5. Choi, M. K. et al. Nat. Commun. 6, 7149 (2015).

    CAS  Article  Google Scholar 

  6. Wang, Y., Fedin, I., Zhang, H. & Talapin, D. V. Science 357, 385–388 (2017).

    CAS  Article  Google Scholar 

  7. Ko, J. et al. ACS Appl. Mater. Interfaces 12, 42153–42160 (2020).

    Article  Google Scholar 

  8. Yang, J. et al. Nat. Commun. 11, 1–9 (2020).

    CAS  Article  Google Scholar 

  9. Lu, S. et al. Angew. Chemie Int. Ed. e202202633 (2022).

  10. Liu, Z. et al. Light Sci. Appl. 9, 1–23 (2020).

    Article  Google Scholar 

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Correspondence to Lei Qian.

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Fan, J., Qian, L. Quantum dot patterning by direct photolithography. Nat. Nanotechnol. 17, 906–907 (2022).

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