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Quantum dot patterning by direct photolithography

A ‘dual-ligand passivation system’ is designed and synthesized to functionalize colloidal quantum dots to realize ultra-high resolution patterns by direct photolithography.

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Fig. 1: Schematic illustration of QD patterning process.

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Correspondence to Lei Qian.

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Fan, J., Qian, L. Quantum dot patterning by direct photolithography. Nat. Nanotechnol. 17, 906–907 (2022). https://doi.org/10.1038/s41565-022-01187-0

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  • DOI: https://doi.org/10.1038/s41565-022-01187-0

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