Fig. 5: Thermal resistance measurement results. | Microsystems & Nanoengineering

Fig. 5: Thermal resistance measurement results.

From: Micron-gap spacers with ultrahigh thermal resistance and mechanical robustness for direct energy conversion

Fig. 5

a Graph of thermal resistance at increasing applied pressure for many different spacer samples. For each series of data, the dashed lines represent the \({P}_{eff}^{ - 0.94}\) scaling predicted by the theory of contact thermal conductance43. The horizontal range was 1% based on the verified specification of the force sensor. b Graph of thermal resistance vs. thickness of the ALD alumina with a spacer gap d of 4–6 μm. c Graph of thermal resistance vs. gap distance for a spacer thickness t of ~800 nm. The data for (b, c) are for spacers with the expanding hexagon design at an applied pressure of 100–300kPa. The horizontal error bar for (b) is 5% based on experimental variation in the deposition process. d Schematic of model for the heat flow through a single paired point contact in the spacer rib. (top) The spacer only contacts the top and bottom electrodes at small points that are sparse along the length of the rib. (bottom) The heat flow is primarily between proximal opposite contacts points in the top and bottom of the spacer. The area of the contact points is modeled to have side lengths similar to the thickness (t) of the alumina film, and the width through which the heat flows is estimated to be similar to the spacer height d

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