Fig. 3: Metasurface element optimization. | Light: Science & Applications

Fig. 3: Metasurface element optimization.

From: High-efficiency, large-area, topology-optimized metasurfaces

Fig. 3

a At the beginning of the optimization process, the initial dielectric distribution is a random dielectric continuum. The dashed lines indicate the desired scattering angle of 20° and phase of π/2. After 10 iterations, the scattering profile is already highly directional. After 100 iterations, the optimization is complete and the metasurface section is a binary structure of silicon and air that supports the desired scattering metrics. b An intensity plot that shows the scattered fields of the optimized metasurface element

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