Article PDF
References
“Polyimides Fundamentals and Applications,” M. K. Ghosh and K. L. Mittal, Ed., Marcel Dekker, New York, 1996.
“Photosensitive Polyimides Fundamentals and Applications,” K. Horie and T. Yamashita, Ed., Technomic, Lancaster, 1995.
Y. Watanabe, Y. Shibasaki, S. Ando, and M. Ueda, Polym. J., 37, 270 (2005).
T. Miwa and S. Numata, Polymer, 30, 893 (1989).
J. A. Kreuz, J. Polym. Sci., Part A: Polym. Chem., 28, 3787 (1990).
K. Sakayori, Y. Shibasaki, and M. Ueda, J. Polym. Sci., Part A: Polym. Chem., submitted for publication.
K. E. Pyyor, J. G. W. Shipps, D. A. Skyler, and J. J. Rebek, Tetrahedron, 54, 4107 (1998).
O. Haba, M. Okazaki, T. Nakayama, and M. Ueda, J. Photopolym. Sci. Technol., 10, 55 (1997).
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Sakayori, K., Shibasaki, Y. & Ueda, M. A Positive-Type Alkaline-Developable Photosensitive Polyimide Based on the Poly(amic acid) from 2,2′,6,6′-Biphenyltetracarboxylic Dianhydride and 1,3-Bis(4-aminophenoxy)benzene, and a Diazonaphthoquinone. Polym J 38, 1189–1193 (2006). https://doi.org/10.1295/polymj.PJ2006051
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1295/polymj.PJ2006051
Keywords
This article is cited by
-
Microfabrication of functional polyimide films and microstructures for flexible MEMS applications
Microsystems & Nanoengineering (2023)