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The yield of the polyradical 1a generated upon the photolysis of the cast film of 1d was estimated to be ca. 50% of the accessible number of radical spins, assuming that a self-filtering effect due to strong UV-Vis absorbance of 1d (ε=(1—2)x104 cm−M−1 in the region 250—350nm) only allows photolysis to a depth of ca. 0.2 μm of the cast film surface and that two radicals are generated per the oxalate group through the photolytic cleavage, one pendant-attached radical plus one leaving group radical.
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Takahashi, M., Nasu, Y., Nishide, H. et al. Polyphenoxyl Radical Photochemically Generated from the Oxalate Derivative of Poly(1,2-phenylenevinylene). Polym J 31, 203–205 (1999). https://doi.org/10.1295/polymj.31.203
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DOI: https://doi.org/10.1295/polymj.31.203