Abstract
Poly(methacrylate)s having thymine derivatives were studied for photodimerizations of thymine units in solution and in the film state, and photolithographic sensitivity tests for their applicability to negative type photoresists. In these homopolymers and copolymers, thymine bases were attached to the polymer chain at positions N1 or N3. Among these polymers, the alternate copolymer indicated the highest photosensitivity. The results are discussed from the viewpoint of intra- and/or intermolecular photodimerization and the quantum yields in solution and in the film state.
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Jalili Moghaddam, M., Hozumi, S., Inaki, Y. et al. Functional Monomers and Polymers CLXVIII. Syntheses and Photoreactions of Poly(methacrylate)s Containing Thymine Bases. Polym J 21, 203–213 (1989). https://doi.org/10.1295/polymj.21.203
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DOI: https://doi.org/10.1295/polymj.21.203