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Optical lithography

Lithography at EUV wavelengths

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Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10-nm light sources that could support lithography over the coming decades.

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Figure 1: Over the past twenty years, the field of lithography has seen a dramatic reduction in both the half-pitch feature size and the wavelengths used, but at very different rates.

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Tallents, G., Wagenaars, E. & Pert, G. Lithography at EUV wavelengths. Nature Photon 4, 809–811 (2010). https://doi.org/10.1038/nphoton.2010.277

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  • DOI: https://doi.org/10.1038/nphoton.2010.277

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