Industry Perspective | Published:

EUV lithography

Lithography gets extreme

Nature Photonics volume 4, pages 2426 (2010) | Download Citation

Extreme ultraviolet lithography extends photolithography to much shorter wavelengths and is a cost-effective method of producing more-advanced integrated circuits. Although some infrastructure challenges still remain, this technology is expected to begin high-volume microchip production within the next three years.

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Acknowledgements

The authors would like to thank David Brandt of Cymer and Hans Meiling of ASML for their help in creating this article.

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Affiliations

  1. Christian Wagner is Senior Product Manager of EUV at ASML, PO Box 324, 5500 AH Veldhoven, The Netherlands.

    • Christian Wagner
  2. Noreen Harned is Vice President of Marketing EUV at ASML, PO Box 324, 5500 AH Veldhoven, The Netherlands.

    • Noreen Harned

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Correspondence to Christian Wagner.

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DOI

https://doi.org/10.1038/nphoton.2009.251

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