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Advanced scanning probe lithography

Nature Nanotechnology volume 9, pages577–587(2014)Cite this article

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Abstract

The nanoscale control afforded by scanning probe microscopes has prompted the development of a wide variety of scanning-probe-based patterning methods. Some of these methods have demonstrated a high degree of robustness and patterning capabilities that are unmatched by other lithographic techniques. However, the limited throughput of scanning probe lithography has prevented its exploitation in technological applications. Here, we review the fundamentals of scanning probe lithography and its use in materials science and nanotechnology. We focus on robust methods, such as those based on thermal effects, chemical reactions and voltage-induced processes, that demonstrate a potential for applications.

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Figure 1: Scanning probe lithography.
Figure 2: Nanofabrication landscape.
Figure 3: Thermal and thermochemical scanning probe lithography.
Figure 4: Greyscale thermal and thermochemical scanning probe lithography.
Figure 5: Oxidation scanning probe lithography.
Figure 6: Silicon and graphene nanolectronic devices fabricated by oxidation scanning probe lithography.

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Acknowledgements

Financial support from the European Research Council AdG no. 340177 (R.G.) and StG no. 307079 (A.W.K.), the European Commission FP7-ICT-2011 no. 318804 (R.G. and A.W.K.), the Swiss National Science Foundation SNSF no. 200020-144464 (A.W.K.), the Ministerio de Economía y Competitividad MAT2013-44858-R (R.G.), the National Science Foundation CMMI-1100290 (E.R.), the MRSEC program DMR-0820382 (E.R.) and the Office of Basic Energy Sciences of the Department of Energy DE-SC0002245 (E.R.) are acknowledged.

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Affiliations

  1. Instituto de Ciencia de Materiales de Madrid, CSIC, Sor Juana Inés de la Cruz 3, Madrid, 28049, Spain

    Ricardo Garcia

  2. IBM Research - Zurich, Saeumerstr. 4, 8803, Rueschlikon, Switzerland

    Armin W. Knoll

  3. School of Physics, Georgia Institute of Technology, Atlanta, 30332-0400, Georgia, USA

    Elisa Riedo

Authors
  1. Ricardo Garcia
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  2. Armin W. Knoll
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  3. Elisa Riedo
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Correspondence to Elisa Riedo.

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Garcia, R., Knoll, A. & Riedo, E. Advanced scanning probe lithography. Nature Nanotech 9, 577–587 (2014). https://doi.org/10.1038/nnano.2014.157

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