Abstract
Academic and industrial research groups are currently working to obtain high-quality transparent ultralow-refractive-index and ultralow-dielectric-constant thin films, as they are important for designing smart devices and systems for microoptics and microelectronics (for example, multilayer structures, optical resonators, photonic crystals, Cu interconnects, insulating layers and so on)1. Here, we report a robust and simple procedure to prepare highly porous and resistant semicrystalline magnesium oxyfluoride thin films through liquid deposition followed by a flash and short thermal treatment. These films are water insensitive, mechanically resistant (E=1 GPa), exhibit high optical quality and have an ultralow refractive index (n700 nm=1.09) and an ultralow dielectric constant (k100 kHz=1.6) which are required for the above-mentioned applications. Moreover, the process used to prepare these nanomaterials is well suited for industrial production on larger surfaces.
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References
Maex, K. et al. Low dielectric constant materials for microelectronics. J. Appl. Phys. 93, 8793–8841 (2003).
Fujihara, S., Tada, M. & Kimura, T. Preparation and characterisation of MgF2 thin films by a trifluoroacetic acid method. Thin Solid Films 304, 252–255 (1997).
Grosso, D. et al. Two-dimensional hexagonal mesoporous silica thin films prepared from block copolymers: Detailed characterization and formation mechanism. Chem. Mater. 13, 1848–1856 (2001).
Konjhodzic, D., Bretinger, H. & Marlow, F. Structure and properties of low-n mesoporous silica films for optical applications. Thin Solid films 495, 333–337 (2006).
Xi, J.-Q. et al. Very low-refractive-index optical thin films consisting of an array of SiO2 nanorods. Opt. Lett. 31, 601–603 (2006).
Navamathavan, R., Choi, C. K. & Lee, K. M. Studies of low-dielectric constant SiOC(-H) thin films deposited by using MTES/O-2-PECVD. J. Korean Phys. Soc. 48, 1675–1679 (2006).
Easwarakhanthan, T., Beyssen, D., Le Brizoual, L. & Bougdira, J. J. Vac. Sci. Technol. 24, 1036–1043 (2006).
Grosso, D. et al. Fundamentals of mesostructuring through evaporation-induced self-assembly. Adv. Funct. Mater. 14, 309–322 (2004).
Matheron, M. et al. Mesoporous 3D-hexagonal organosilicate films: Post-synthesis grafting versus direct synthesis. Thin Solid Films 495, 175–179 (2006).
Matheron, M. et al. Ordered mesoporous organosilica films. Stud. Surf. Sci. Catal. 156, 327–334 (2005).
Grosso, D., Boissiere, C. & Sanchez, C. Oxyfluorures poreux nanostructurés. French patent No. FR05/11.659.
Boissiere, C. et al. Porosity and mechanical properties of mesoporous thin films assessed by environmental ellipsometric porosimetry. Langmuir 21, 12362–12371 (2005).
Tada, M., Fujihara, S. & Kimura, T. Sol-gel processing and characterization of alkaline earth and rare-earth fluoride thin films. J. Mater. Res. 14, 1610–1616 (1999).
Fujihara, S., Tada, M. & Kimura, T. Controlling factors for the conversion of trifluooroacetate sols into thin metal fluoride coatings. J. Sol-Gel Sci. Technol. 19, 311–314 (2000).
Acknowledgements
The authors would like to thank C. Sinturel for XPS analyses, the low-k team at the CRCD Air-Liquide for the k-value determination, E. Bartel and N. Chemin for nanoindentation analyses, the European Network of Excellence FAME and the CNRS. The Centre of Electronic Microscopy of Orléans (France) is acknowledged for the TEM analyses.
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Grosso, D., Boissière, C. & Sanchez, C. Ultralow-dielectric-constant optical thin films built from magnesium oxyfluoride vesicle-like hollow nanoparticles. Nature Mater 6, 572–575 (2007). https://doi.org/10.1038/nmat1950
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DOI: https://doi.org/10.1038/nmat1950
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