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Lithographically patterned nanowire electrodeposition

Nature Materials volume 5, pages 914–919 (2006)Cite this article

Abstract

Nanowire fabrication methods can be classified either as ‘top down’, involving photo- or electron-beam lithography, or ‘bottom up’, involving the synthesis of nanowires from molecular precursors. Lithographically patterned nanowire electrodeposition (LPNE) combines attributes of photolithography with the versatility of bottom-up electrochemical synthesis. Photolithography defines the position of a sacrificial nickel nanoband electrode, which is recessed into a horizontal trench. This trench acts as a ‘nanoform’ to define the thickness of an incipient nanowire during its electrodeposition. The electrodeposition duration determines the width of the nanowire. Removal of the photoresist and nickel exposes a polycrystalline nanowire — composed of gold, platinum or palladium — characterized by thickness and width that can be independently controlled down to 18 and 40 nm, respectively. Metal nanowires prepared by LPNE may have applications in chemical sensing and optical signal processing, and as interconnects in nanoelectronic devices.

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Figure 1
Figure 2: ‘Overetching’ of the nickel layer produces a horizontal trench originating at the edge of the photoresist.
Figure 3: The filling and the eventual overfilling of the trench with gold, platinum or palladium produces a distinctive wire electrodeposition-current transient.
Figure 5: Both the thickness of a nanowire produced by LPNE and its width may be independently controlled.
Figure 4: Examples of patterned nanowires prepared using LPNE.
Figure 6: A high degree of wire uniformity results in nanowires that are electrically continuous for up to 1.0 cm.

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Acknowledgements

The National Science Foundation funded this work through grant CHE-0111-557.

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  1. M. A. Thompson and C. Xiang: These authors contributed equally to this work

Authors and Affiliations

  1. Institute For Surface and Interface Science and Department of Chemistry, University of California, Irvine, California, 92679-2025, USA

    E. J. Menke, M. A. Thompson, C. Xiang, L. C. Yang & R. M. Penner

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  1. E. J. Menke
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Correspondence to R. M. Penner.

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Menke, E., Thompson, M., Xiang, C. et al. Lithographically patterned nanowire electrodeposition. Nature Mater 5, 914–919 (2006). https://doi.org/10.1038/nmat1759

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