Figure 3

From: Soft electrostatic trapping in nanofluidics

Figure 3

Side view sketch, three-dimensional (3D)-model and scaning electron microscope (SEM) images of the fabrication steps of the GIE trapping devices. Scale bars: 1 μm. (a) Fabrication of a silicon master using top-down nanofabrication tools in cleanroom facilities highlighting the main fabrication steps of the nanofluidic GIE trapping region. (b) Replica molding of the original silicon master using a UV curable resin (OrmoStamp) to obtain a negative master. This step can be repeated unlimited to receive multiple negative masters enabling a high-throughput production of polydimethylsiloxane (PDMS) devices. Each obtained OrmoStamp master can be repeatedly used for PDMS replica molding. (c) Replica molding of the negative OrmoStamp master into PDMS. The cured PDMS devices were plasma activated and covalently bound to a coverslip glass. (d) Sketch of high-throughput fabrication using two-step replica molding. RIE, reactive ion etching.