Experimental results of beam switching metasurface. (a) SEM micrograph of the beam switching metasurface fabricated by electron beam lithography. (b) Transmittance for the fabricated metasurface in amorphous (left) and crystalline (right) state. (c) Infrared camera images and intensity plots (same arbitrary units scale) of the beam transmitted by the active metasurface in the amorphous (left) and crystalline (right) state. As designed, the deviated beam switches to the opposite side of the main beam after inducing crystallization in the phase-change material.