Correction to: Light: Science & Applications (2012) 1, e30; doi:10.1038/lsa.2012.30
This article, published on 28 September, should have been published with an accompanying supplementary information video file online.
This supplementary information file is now been published with erratum; we apologize for the omission.
Additional information
The online version of the original article can be found at 10.1038/lsa.2012.30
Supplementary information
Rights and permissions
This work is licensed under the Creative Commons Attribution-NonCommercial-No Derivative Works 3.0 Unported License. To view a copy of this license, visit http://creativecommons.org/licenses/by-nc-nd/3.0/
About this article
Cite this article
Edwards, C., Arbabi, A., Popescu, G. et al. Erratum: Optically monitoring and controlling nanoscale topography during semiconductor etching. Light Sci Appl 1, e44 (2012). https://doi.org/10.1038/lsa.2012.44
Published:
Issue Date:
DOI: https://doi.org/10.1038/lsa.2012.44
