Abstract
THE deleterious effects of adsorptive activity in supporting media for gas chromatography are well known; broad, long-tailed peaks are obtained, making area measurements in quantitative work more difficult, and obscuring small peaks due to impurities following a major peak. In so far as adsorptive activity may be due to metallic impurities, some amelioration is commonly effected by acid or alkali washing. However, the surface even of pure silica possesses active adsorption sites, presumably due to free OH groups, and several authors have indicated that adsorption due to this cause can be greatly reduced by treatment of the support with certain reactive silicon compounds.
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ATKINSON, E., TUEY, G. In Situ Treatment of Kieselguhr for Gas Chromatography. Nature 199, 482–483 (1963). https://doi.org/10.1038/199482a0
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DOI: https://doi.org/10.1038/199482a0
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