Abstract
IN the Tolansky method for the measurement of the thickness of thin films by multiple beam interference we have used a narrow channel in the film rather than a sharp step1. The channel can be formed by gently drawing a needle across the film before the deposition of the reflecting over-layer. The technique is easily applied and has several advantages especially when the substrate is not optically flat as in the case of microscope slides.
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References
Scott, G. D., McLauchlan, T. A., and Sennett, R. S., J. App. Phys., 21, 843 (1950).
Weaver, C., and Benjamin, P., Nature, 182, 1149 (1958).
Scott, G. D., J. Opt. Soc. Amer., 48, 858 (1958).
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SCOTT, G. Substrate Damage in Film Thickness Measurement by Beam Interferometry. Nature 184, 354–355 (1959). https://doi.org/10.1038/184354b0
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DOI: https://doi.org/10.1038/184354b0
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