Editorial Board

Advisory Board

Chihaya Adachi, Kyushu University, Japan
Kazunari Akiyoshi, Kyoto University, Japan
Takuzo Aida, University of Tokyo, Japan
Zhenan Bao, Stanford University, USA
Paul W.M Blom, Max Planck Institute for Polymer Research, Germany
Kookheon Char, Seoul National University, South Korea
Show-An Chen, National Tsing Hua University, Taiwan
Wen-Chang Chen, National Taiwan University, Taiwan
Kilwon Cho, POSTECH, South Korea
Richard Evans, CSIRO, Australia
Hiroshi Funakubo, Tokyo Institute of Technology, Japan
Jian Ping Gong, Hokkaido University, Japan
Michikazu Hara, Tokyo Institute of Technology, Japan
Hiroyuki Hirayama, Tokyo Institute of Technology, Japan
Hideo Hosono, Tokyo Institute of Technology, Japan
Tomokazu Iyoda, Doshisha University, Japan
Ali Javey, UC Berkeley, USA
Alex K.-Y. Jen, University of Washington, USA
Unyong Jeong, POSTECH, South Korea
Lei Jiang, Technical Institute of Physics and Chemistry, CAS, China
Hee-Tae Jung, KAIST, South Korea
Prashant Kamat, University of Notre Dame, USA
Eunkyoung Kim, Yonsei University, South Korea
Jang-Joo Kim, Seoul National University, South Korea
Jin Kon Kim, POSTECH, South Korea
Chih-Huang Lai, National Tsing Hua University, Taiwan
Chun-Sing Lee, City University of Hong Kong, China
Kwang-Sup Lee, Hannam University, South Korea
Pooi See Lee, Nanyang Technological University, Singapore
Dan Li, Monash University, Australia
Jingfeng Li, Tsinghua University, China
Chwee Teck Lim, National University of Singapore, Singapore
Meilin Liu, Georgia Institute of Technology, USA
Zhong-Fan Liu, Peking University, China
Neil Mathur, University of Cambridge, United Kingdom
Ian Manners, University of Bristol, UK
Chad A. Mirkin, Northwestern University, USA
Akira Nakajima, Tokyo Institute of Technology, Japan
Hideo Ohno, Tohoku University, Japan
Teruo Ono, Kyoto University, Japan
Jiwoong Park, University of Chicago, USA
Nam-Gyu Park, Sungkyunkwan University, South Korea
T. Pradeep, Indian Institute of Technology Madras, India
John A. Rogers, Northwestern University, USA
Ulrich S. Schubert, Friedrich-Schiller-Universität Jena, Germany
Jianlin Shi, Shanghai Institute of Ceramics CAS, China
Toshikazu Takata, Tokyo Institute of Technology, Japan
Weihong Tan, University of Florida, USA
Zhiyong Tang, National Center for Nanoscience and Technology, China
Richard Tilley, Victoria University of Wellington, NZ
Lijun Wan, Institute of Chemistry CAS, China
Zhong Lin Wang, Georgia Institute of Technology, USA
Paul S. Weiss, UC Los Angeles, USA
Peidong Yang, UC Berkeley, USA
Eiji Yashima, Nagoya University, Japan
Seung Man Yang, KAIST, South Korea
Jinhua Ye, NIMS, Japan
Yadong Yin, UC Riverside, USA
Hua Zhang, Nanyang Technological University, Singapore
Liangfang Zhang, UC San Diego, USA