April 1, 1973
1 min read
Ion Implantation
Microelectronic devices are now being "doped" with impurity atoms by firing ionized atoms into the device with an accelerator. The technique offers greater precision than the older diffusion method
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April 1, 1973
1 min read
Ion Implantation
Microelectronic devices are now being "doped" with impurity atoms by firing ionized atoms into the device with an accelerator. The technique offers greater precision than the older diffusion method