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Nature Nanotechnology 3, 185 - 186 (2008)
doi:10.1038/nnano.2008.79
Subject Categories: Computational nanotechnology | Molecular self-assembly | Surface patterning and imaging
Surface patterning: Silicon falls into line
Stacey F. Bent1
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Stacey F. Bent is in the Department of Chemical Engineering, Stanford University, Stanford, California 94305, USA.
e-mail: sbent@stanford.edu
Abstract
Dipole-directed self-assembly can be used to create robust one-dimensional nanostructures on silicon. It also provides new insights into interactions between molecules and this important technological material.
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