Molecular beam epitaxy is widely used in research and industry to make semiconductor devices and structures. However, despite its ability to control matter with near-atomic precision, the technique is overlooked in most histories of nanoscience and nanotechnology.
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Acknowledgements
The author acknowledges Alfred Cho and Art Gossard for their comments and recollections. This research is based upon work supported by the National Science Foundation under Grant No. SES 0531184. Any opinions, findings, and conclusions or recommendations expressed in this material are those of the author and do not necessarily reflect the views of the NSF.
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McCray, W. MBE deserves a place in the history books. Nature Nanotech 2, 259–261 (2007). https://doi.org/10.1038/nnano.2007.121
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DOI: https://doi.org/10.1038/nnano.2007.121
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