Letter abstract


Nature Nanotechnology 1, 117 - 121 (2006)
Published online: 29 October 2006 | doi:10.1038/nnano.2006.94

Subject terms: Nanoparticles | Surface patterning and imaging

Parallel patterning of nanoparticles via electrodynamic focusing of charged aerosols: 

Hyoungchul Kim1,2, Jaehyun Kim1,3, Hongjoo Yang1,4, Jeongsoo Suh1,3, Taeyoung Kim1,3, Bangwoo Han1,5, Sungwon Kim1,3, Dae Seong Kim1,6, Peter V. Pikhitsa1,7 & Mansoo Choi1


The development of nanodevices that exploit the unique properties of nanoparticles1, 2 will require high-speed methods for patterning surfaces with nanoparticles over large areas and with high resolution3, 4, 5, 6. Moreover, the technique will need to work with both conducting and non-conducting surfaces. Here we report an ion-induced parallel-focusing approach that satisfies all requirements. Charged monodisperse aerosol nanoparticles are deposited onto a surface patterned with a photoresist while ions of the same polarity are introduced into the deposition chamber in the presence of an applied electric field. The ions accumulate on the photoresist, modifying the applied field to produce nanoscopic electrostatic lenses that focus the nanoparticles onto the exposed parts of the surface. We have demonstrated that the technique could produce high-resolution patterns at high speed on both conducting (p-type silicon) and non-conducting (silica) surfaces. Moreover, the feature sizes in the nanoparticle patterns were significantly smaller than those in the original photoresist pattern.

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  1. National CRI Center for Nano Particle Control, Institute of Advanced Machinery and Design, School of Mechanical and Aerospace Engineering, Seoul National University, Seoul 151-742, Korea
  2. Present address: Nano-Materials Research Center, Korea Institute of Science and Technology, Seoul 136-791, Korea
  3. Present address: Samsung Electronics, Gyeonggi-do 449-901, Korea
  4. Present address: LG-Philips LCD, Gyungsangbuk-do 730-726, Korea
  5. Present address: Eco-machinery Engineering Department, Korea Institute of Machinery and Materials, Daejeon 305-343, Korea
  6. Present address: Hyundai Calibration and Certification Technologies, Kyoungki-do 467-701, Korea
  7. On leave from Physics Institute, Odessa National University, Ukraine

Correspondence to: Mansoo Choi1 e-mail: mchoi@snu.ac.kr



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