Letter abstract


Nature Materials 6, 572 - 575 (2007)
Published online: 24 June 2007 | doi:10.1038/nmat1950

Subject Categories: Optical, photonic and optoelectronic materials | Nanoscale materials | Porous materials | Surface and thin films

Ultralow-dielectric-constant optical thin films built from magnesium oxyfluoride vesicle-like hollow nanoparticles

David Grosso, Cédric Boissière & Clément Sanchez

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Academic and industrial research groups are currently working to obtain high-quality transparent ultralow-refractive-index and ultralow-dielectric-constant thin films, as they are important for designing smart devices and systems for microoptics and microelectronics (for example, multilayer structures, optical resonators, photonic crystals, Cu interconnects, insulating layers and so on)1. Here, we report a robust and simple procedure to prepare highly porous and resistant semicrystalline magnesium oxyfluoride thin films through liquid deposition followed by a flash and short thermal treatment. These films are water insensitive, mechanically resistant (E=1 GPa), exhibit high optical quality and have an ultralow refractive index (n700 nm=1.09) and an ultralow dielectric constant (k100 kHz=1.6) which are required for the above-mentioned applications. Moreover, the process used to prepare these nanomaterials is well suited for industrial production on larger surfaces.

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  1. Chimie de la Matière Condensée de Paris, UMR UPMC-CNRS 7574, Université Pierre et Marie Curie (paris 6), 4 place Jussieu, Tour 54-5E, 75252 Paris 05, France

Correspondence to: Clément Sanchez e-mail: clems@ccr.jussieu.fr

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