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Nature 430, 630 (5 August 2004) | doi:10.1038/430630a; Published online 4 August 2004

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Thin films:  Unexpected magnetism in a dielectric oxide

M. Venkatesan, C. B. Fitzgerald & J. M. D. Coey

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It is generally accepted that magnetic order in an insulator requires the cation to have partially filled shells of d or f electrons. Here we show that thin films of hafnium dioxide (HfO2), an insulating oxide better known as a dielectric layer for nanoscale electronic devices, can be ferromagnetic even without doping. This discovery challenges our understanding of magnetism in insulators, because neither Hf4+ nor O2- are magnetic ions and the d and f shells of the Hf4+ ion are either empty or full.

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