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Brief Communications

Nature 412, 697-698 (16 August 2001) | doi:10.1038/35089130

Open Innovation Challenges

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Finer features for functional microdevices

Satoshi Kawata1, Hong-Bo Sun1, Tomokazu Tanaka1 & Kenji Takada1

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Micromachines can be created with higher resolution using two-photon absorption.

Compared with light or electron-beam lithography, the virtue of two-photon photopolymerization1 as a tool for making microdevices lies in its three-dimensional capability, which has found application in photonic devices2, 3, 4 and micromachines1, 5, 6 with feature sizes close to the diffraction limit. Here we show that the diffraction limit can be exceeded by non-linear effects to give a subdiffraction-limit spatial resolution of 120 nanometres.