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Letters to Nature

Nature 401, 682-684 (14 October 1999) | doi:10.1038/44352; Received 23 March 1999; Accepted 13 September 1999

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Lanthanum-substituted bismuth titanate for use in non-volatile memories

B. H. Park1, B. S. Kang1, S. D. Bu1, T. W. Noh1, J. Lee2 & W. Jo3

  1. Department of Physics and Condensed Matter Research Institute, Seoul National University, Seoul 151-742, Korea
  2. Department of Materials Engineering, Sung Kyun Kwan University, Suwon 440-746, Korea
  3. LG Corporate Institute of Technology, Seoul 137-140, Korea

Correspondence to: T. W. Noh1 Correspondence and requests for materials should be addressed to T.W.N. (e-mail: Email: twnoh@phya.snu.ac.kr).

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Non-volatile memory devices are so named because they retain information when power is interrupted; thus they are important computer components. In this context, there has been considerable recent interest1, 2 in developing non-volatile memories that use ferroelectric thin films—'ferroelectric random access memories', or FRAMs—in which information is stored in the polarization state of the ferroelectric material. To realize a practical FRAM, the thin films should satisfy the following criteria: compatibility with existing dynamic random access memory technologies, large remnant polarization (Pr) and reliable polarization-cycling characteristics. Early work focused on lead zirconate titanate (PZT) but, when films of this material were grown on metal electrodes, they generally suffered from a reduction of Pr ('fatigue') with polarity switching. Strontium bismuth tantalate (SBT) and related oxides have been proposed to overcome the fatigue problem3, but such materials have other shortcomings, such as a high deposition temperature. Here we show that lanthanum-substituted bismuth titanate thin films provide a promising alternative for FRAM applications. The films are fatigue-free on metal electrodes, they can be deposited at temperatures of approx650 °C and their values of Pr are larger than those of the SBT films.

  1. Department of Physics and Condensed Matter Research Institute, Seoul National University, Seoul 151-742, Korea
  2. Department of Materials Engineering, Sung Kyun Kwan University, Suwon 440-746, Korea
  3. LG Corporate Institute of Technology, Seoul 137-140, Korea

Correspondence to: T. W. Noh1 Correspondence and requests for materials should be addressed to T.W.N. (e-mail: Email: twnoh@phya.snu.ac.kr).