Abstract
The application of laser radiation to the processing of silicon and silicon-based solid state devices has developed in the past two decades. A few of these techniques are becoming established practice in the semiconductor industry, whilst others remain the subject of research and heated debate. Techniques include the solid phase and the liquid phase regrowth of amorphous silicon layers, together with the more novel application of laser photochemistry.
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Boyd, I., Wilson, J. Laser processing of silicon. Nature 303, 481–486 (1983). https://doi.org/10.1038/303481a0
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DOI: https://doi.org/10.1038/303481a0
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