Abstract
Well-defined poly(methyl methacrylate) (PMMA) brush layers were prepared onto silicon wafers by surface-initiated atom transfer radical polymerization using 2-(4-chlorosulfonylphenyl)-ethyltrichlorosilane as an initiator. Based on molecular weight and layer thickness measurements, it was deduced that the apparent graft density was 0.6–0.8 chains nm-2 depending on the polymerization time and that the conformation of tethered chains was highly extended. Surface relaxation behavior of the PMMA brush layer and the spin-coated PMMA film was examined by lateral force microscopy. The αa- and β-relaxation processes were discernibly observed at both surfaces. Although surface molecular motion of the brush layer and the spin-coated film was markedly different from the bulk one, both were hardly distinguishable in terms of relaxation phenomena.
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Tanaka, K., Kojio, K., Kimura, R. et al. Surface Relaxation Processes of Poly(methyl methacrylate) Brushes Prepared by Atom Transfer Radical Polymerization. Polym J 35, 44–49 (2003). https://doi.org/10.1295/polymj.35.44
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DOI: https://doi.org/10.1295/polymj.35.44