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Influence of a Chemisorbed Film on Subsequent Physical Adsorption Processes

Abstract

Stone and Tiley1 have reported that the presence of a chemisorbed film of carbon monoxide reduces the low-temperature physical adsorption of krypton on a copper oxide catalyst. This observation is of particular interest, because the accepted method2 of estimating the area of free metal in a mixed surface involves the assumptions that, at low temperatures, carbon monoxide is initially chemisorbed only on the metal surface, and afterwards physically adsorbed over the whole surface; and that the chemisorbed layer and the bare non-metallic surface have the same adsorption characteristics.

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References

  1. Stone and Tiley, Nature, 167, 654 (1951).

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  2. Emmett and Brunauer, J. Amer. Chem. Soc., 59, 1553 (1937).

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  3. Podgurski, Kummer, De Witt and Emmett, J. Amer. Chem. Soc., 72, 5382 (1950).

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JOY, A., DORLING, T. Influence of a Chemisorbed Film on Subsequent Physical Adsorption Processes. Nature 168, 433–434 (1951). https://doi.org/10.1038/168433a0

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